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X-ray Focusing System


New Generation of X-ray Focusing System for Advanced Technologies and Basic Research

Tech Area / Field

  • PHY-OPL/Optics and Lasers/Physics

3 Approved without Funding

Registration date

Leading Institute
VNIIEF, Russia, N. Novgorod reg., Sarov

Supporting institutes

  • Budker Institute of Nuclear Physics, Russia, Novosibirsk reg., Akademgorodok\nInstitute of Microelectronics Technology and High Purity Materials, Russia, Moscow reg., Chernogolovka


  • European Synchrotron Radiation Facility, France, Grenoble\nInternational Academy of Science and Technology, USA, CA, Glendale\nUniversity of Illinois, USA, IL, Urbana\nHumboldt-University, Germany, Berlin\nArgonne National Laboratory (ANL) / Advanced Photon Source, USA, IL, Argonne

Project summary

The objectives of the project are:

q To develop the manufacture technology and to optimize the characteristics of high efficient planar parabolic lenses for hard x-rays (8-16 keV) on the basis of kinoform elements and multilayer structures;

q To investigate the growth dynamics of the sputtered thin films (1-5 m) using plasma-chemical method.

Last ten years are characterized by intensive development of synchrotron sources of x-rays. For complete application of unique synchrotron features in fundamental and applied researches (x-ray tomography, lithography, material science, certification of spectral elements and means of x-ray diagnostics etc.) high efficient focusing systems are required which form monochromatic and polychromatic x-rays with the size of focal spot less then 0.1m and provide an pergence of output x-ray beam 10-3 radians within quantum energy range of h10-20 keV.

Within the framework of this project the following tasks suppose to be solved:

§ To develop the manufacture technology of high-efficient planar parabolic lenses, basing on kinoform elements which allow to focus hard x-rays into linear focus with width less then 1m;

§ To develop the manufacture technology of high efficient x-ray waveguides with radiation enhancement of 300-400 on the base of multilayer structure, compressing the x-ray beam to the sizes less than 0.05m;
§ To make a calculating and theoretical optimization of parameters of focusing system, consisting of planar parabolic lens and waveguide for the energy of 14 keV;
§ To make calculations and to receive data on focusing system radiation resistance to powerful synchrotron radiation flux;
§ To manufacture a focusing system for x-ray with the energy of 14 keV and to test it, using the synchrotron radiation source;
§ To manufacture thin SiO2, SiO2+I and Cd films with the thickness of 1-5m and to investigate the mechanism of its growth using the focusing system on synchrotron.

The experience, accumulated during this project realization, is being supposed to be applied in creation of new nanotechnologies, x-ray lithography and carrying out the fundamental and applied researches on synchrotron radiation sources of third and fourth generation.

It is supposed to complete this work in 3 years.


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