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Laser Projection System Diffraction Limit


Physics and Techniques of ArF Excimer Laser Projection System Diffraction Limit Overcoming by Means of the Nonlinear Effects

Tech Area / Field

  • PHY-SSP/Solid State Physics/Physics
  • MAT-ELE/Organic and Electronics Materials/Materials

3 Approved without Funding

Registration date

Leading Institute
Russian Academy of Sciences / Physical Technical Institute, Russia, St Petersburg


  • Thermoptik, Canada, Quebec, Sherbrooke

Project summary

The Project is devoted to the studies of principal physics of diffraction limit overcoming by means of the nonlinear interaction effects for vacuum ultraviolet (VUV) projection system operating with ArF excimer laser.

It is intended to analyze theoretically the opportunities to overcome the diffraction limit by means of feasibility or/and by using different physical and chemical phenomena. The selection of the most prospective organic/inorganic materials and systems will be carried out in according to the analysis performed. The selected materials and systems (one or two of each organic and inorganic) will be synthesized and investigated. The thin (100-500 nm) films of the materials on the transparent for the chosen wavelength range will be made. The techniques of optical and nonlinear-optical measurements will be developed and the equipment to realize the measurements will be constructed. The special attention will be paid to the absorption spectra in 180-250nm range and their changes after exposition of sample together with nonlinear absorption processes on 193nm (ArF excimer laser radiation). The developer of exposed image will be determined and the sensitivity and contrast of image transfer on 193 nm will be evaluated.

The interferential exposure installation will be designed and realised. The interferential pattern will be realized on the installation for selected thin films under different exposure regimes. The possibility to overcome the Rayleigh diffraction limit will be investigated. The physical nature of the non-linear interaction processes and their contribution into resolution achieved will be developed.


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